High Vacuum Sputtering Thin Film System

English
Equipment Brand
世欣科技股份有限公司 (SSI)
Purchase Date
2018.07
Location
人科二館 DS114
Associated Lab
Function Description
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Capable of fabricating magnetostrictive thin film materials such as Co, CoFeB, and multilayer structures like Co/AlOx/CoFeB.
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Enables the fabrication of critical alloy thin films including CoFeB, CoFeV, CoFeW, and CoFeWB, which are essential materials for spintronic devices such as STT-RAM.
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Supports the development of novel flexible and transparent electrode materials, including metal mesh transparent electrodes, advanced metal oxide films, and composite transparent conductive films.
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Capable of producing low-dimensional nanostructured thermoelectric thin films for energy conversion applications.
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Performs high-vacuum annealing processes for material treatment.