High Vacuum Sputtering Thin Film System

High Vacuum Sputtering Thin Film System
English
Equipment Brand 
世欣科技股份有限公司 (SSI)
Purchase Date 
2018.07
Location 
人科二館 DS114
Function Description 
  • Capable of fabricating magnetostrictive thin film materials such as Co, CoFeB, and multilayer structures like Co/AlOx/CoFeB.

  • Enables the fabrication of critical alloy thin films including CoFeB, CoFeV, CoFeW, and CoFeWB, which are essential materials for spintronic devices such as STT-RAM.

  • Supports the development of novel flexible and transparent electrode materials, including metal mesh transparent electrodes, advanced metal oxide films, and composite transparent conductive films.

  • Capable of producing low-dimensional nanostructured thermoelectric thin films for energy conversion applications.

  • Performs high-vacuum annealing processes for material treatment.