Six-Target Magnetron Sputtering System

Six-Target Magnetron Sputtering System
English
Equipment Brand 
Self-assembled
Purchase Date 
2008
Location 
人科二館DS221
Associated Lab 
Taiwan SPIN Research Center
Function Description 

This sputtering system is the first high-vacuum magnetron sputtering system in our center. It is primarily used for fabricating pMJT structures in magnetic memory devices. The chamber can accommodate up to six different target materials.