Six-Target Magnetron Sputtering System
English
儀器廠牌 Equipment Brand
Self-assembled
購置日期 Purchase Date
2008
放置位置 Location
人科二館DS221
所屬實驗室 Associated Lab
功能說明 Function Description
This sputtering system is the first high-vacuum magnetron sputtering system in our center. It is primarily used for fabricating pMJT structures in magnetic memory devices. The chamber can accommodate up to six different target materials.