Ultra-High Vacuum Magnetron Sputtering System
English
Equipment Brand
U L V A C
Purchase Date
2007
Location
人科二館DS221
Associated Lab
Function Description
Equipped with three sputtering chambers designated for (1) pre-treatment, (2) magnesium oxide (MgO), and (3) metal deposition. Through a heating system, the amorphous structure of materials can be recrystallized via annealing. The use of an ultra-high vacuum chamber significantly reduces contamination from impurities during deposition, thereby enhancing the quality of the thin films.