Ultra-High Vacuum Magnetron Sputtering System
English
儀器廠牌 Equipment Brand
U L V A C
購置日期 Purchase Date
2007
放置位置 Location
人科二館DS221
所屬實驗室 Associated Lab
功能說明 Function Description
Equipped with three sputtering chambers designated for (1) pre-treatment, (2) magnesium oxide (MgO), and (3) metal deposition. Through a heating system, the amorphous structure of materials can be recrystallized via annealing. The use of an ultra-high vacuum chamber significantly reduces contamination from impurities during deposition, thereby enhancing the quality of the thin films.